๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Fabrication and characterizations of ZnO thin film transistors prepared by using radio frequency magnetron sputtering

โœ Scribed by R. Navamathavan; Chi Kyu Choi; Eun-Jeong Yang; Jae-Hong Lim; Dae-Kue Hwang; Seong-Ju Park


Book ID
108271636
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
267 KB
Volume
52
Category
Article
ISSN
0038-1101

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Improvement of thickness distribution an
โœ M Takeuchi; K Inoue; Y Yoshino; K Ohwada ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 358 KB

An improvement of thickness distribution and crystallinity in ZnO thin films prepared by radio frequency (rf) planer magnetron sputtering have been studied. Optimum thickness distribution of less than22.2% in a 3-inch wafer is obtained by changing the substrate angle to the ZnO target and is in acco