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Influence of negative ion resputtering on Al-doped ZnO thin films prepared by mid-frequency magnetron sputtering

✍ Scribed by Yongan Cai; Wei Liu; Qing He; Yi Zhang; Tao Yu; Yun Sun


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
452 KB
Volume
256
Category
Article
ISSN
0169-4332

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