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Influence of post-deposition annealing on the microstructure and properties of Ga2O3:Mn thin films deposited by RF planar magnetron sputtering

✍ Scribed by Joo Han Kim; Kyung Ho Yoon

Publisher
Springer US
Year
2008
Tongue
English
Weight
640 KB
Volume
20
Category
Article
ISSN
0957-4522

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