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Deposition of titanium oxide films by reactive High Power Impulse Magnetron Sputtering (HiPIMS): Influence of the peak current value on the transition from metallic to poisoned regimes

✍ Scribed by C. Nouvellon; M. Michiels; J.P. Dauchot; C. Archambeau; F. Laffineur; E. Silberberg; S. Delvaux; R. Cloots; S. Konstantinidis; R. Snyders


Book ID
113919615
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
860 KB
Volume
206
Category
Article
ISSN
0257-8972

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