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On the properties of the gate and substrate current after soft breakdown in ultrathin oxide layers

✍ Scribed by Crupi, F.; Degraeve, R.; Groeseneken, G.; Nigam, T.; Maes, H.E.

Book ID: 114537477
Publisher: IEEE
Year: 1998
Tongue: English
Weight: 121 KB
Volume: 45
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.726650

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