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On the impact of nanotopography of silicon wafers on post-CMP oxide layers

✍ Scribed by R Schmolke; R Deters; P Thieme; R Pech; H Schwenk; G Diakourakis

Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
532 KB
Volume
5
Category
Article
ISSN
1369-8001

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