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On the Chemical Reaction Mode of Polysilicon Deposition from Silane

✍ Scribed by Dr. sc. H. Kühne

Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
728 KB
Volume
28
Category
Article
ISSN
0232-1300

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## On Chemical Kinetics of Silicon Deposition from Silane (111) LPCVD poly Silicon Formation in the Temperature Range 900-950 K LPCVD poly Silicon deposition form silane has been investigated for limited conditions regarding temperature, silane input and pumping speed. It has been found that layer