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On Chemical Kinetics of Silicon Deposition from Silane (VI). The Effect of Wafer Diameter

✍ Scribed by Dr. sc. H. Kühne; H. Harnisch; P. Puk


Publisher
John Wiley and Sons
Year
1991
Tongue
English
Weight
430 KB
Volume
26
Category
Article
ISSN
0232-1300

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On Chemical Kinetics of Silicon Depositi
✍ Dr. sc. H. Kühne 📂 Article 📅 1991 🏛 John Wiley and Sons 🌐 English ⚖ 414 KB

In consequence of hydrogen formation during silane pyrolysis total gas volume increases, when the reaction proceeds at constant total pressure. Any mole of silane decomposed produces two moles of hydrogen. In the present paper expressions are derived for 1' ' and 0.5Ih reaction order describing axia