✦ LIBER ✦
On chemical kinetics of silicon deposition from silane (IV). In-situ phosphorus doping of LPCVD poly silicon in the temperature range 900–950 K
✍ Scribed by Dr. H. Kühne; H. Harnisch; Dr. G. Nüske
- Publisher
- John Wiley and Sons
- Year
- 1990
- Tongue
- English
- Weight
- 376 KB
- Volume
- 25
- Category
- Article
- ISSN
- 0232-1300
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