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New CVD Source Reagents for Osmium Thin Film Deposition

✍ Scribed by H.-L. Yu; Y. Chi; C.-S. Liu; S.-M. Peng; G.-H. Lee

Publisher
John Wiley and Sons
Year
2001
Tongue
English
Weight
355 KB
Volume
7
Category
Article
ISSN
0948-1907

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