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ChemInform Abstract: A New Process for Depositing Tungsten Nitride Thin Films.

✍ Scribed by J. P. LU; W. Y. HSU; J. D. LUTTMER; L. K. MAGEL; H. L. TSAI

Publisher: John Wiley and Sons
Year: 2010
Weight: 31 KB
Volume: 29
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.199819261

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