We report the fabncation of metal-semiconductor-metal (MSM) photo detectors on silicon substrates with CoSi2 electrodes. The electrode patterns have been formed by ion beam synthesis applying maskless implantation with a cobalt focused ion beam. Implantation has been carried out with the substrate a
Nanostructure fabrication by reactive-ion etching of laser-focused chromium on silicon
β Scribed by J.J. McClelland; R. Gupta; R.J. Celotta; G.A. Porkolab
- Publisher
- Springer
- Year
- 1998
- Tongue
- English
- Weight
- 392 KB
- Volume
- 66
- Category
- Article
- ISSN
- 0721-7269
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
Different processes involving an inductively coupled plasma reactor are presented either for deep reactive ion etching or for isotropic etching of silicon. On one hand, high aspect ratio microstructures with aspect ratio up to 107 were obtained on sub-micron trenches. Application to photonic MEMS is
## Abstract Metal nanowires are one of the potential candidates for nanostructured sensing elements used in future portable devices for chemical detection; however, the optimal methods for fabrication have yet to be fully explored. Two routes to nanowire fabrication, electronβbeam lithography (EBL)