Nanostructured Thin Films of Organic–Organometallic Block Copolymers: One-Step Lithography with Poly(ferrocenylsilanes) by Reactive Ion Etching

✍ Scribed by R. G. H. Lammertink; M. A. Hempenius; J. E. van den Enk; V. Z.-H. Chan; E. L. Thomas; G. J. Vancso

• Publisher: John Wiley and Sons
• Year: 2000
• Tongue: English
• Weight: 278 KB
• Volume: 12
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/(sici)1521-4095(200001)12:2<98::aid-adma98>3.0.co;2-5