✦ LIBER ✦

Fabrication of MSM detector structures on silicon by focused ion beam implantation

✍ Scribed by J. Teichert; L. Bischoff; S. Hausmann

Publisher: Elsevier Science
Year: 1997
Tongue: English
Weight: 239 KB
Volume: 35
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(96)00186-4

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✦ Synopsis

We report the fabncation of metal-semiconductor-metal (MSM) photo detectors on silicon substrates with CoSi2 electrodes. The electrode patterns have been formed by ion beam synthesis applying maskless implantation with a cobalt focused ion beam. Implantation has been carried out with the substrate at room temperature and at 400 °C.

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