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Nanopositioning and Nonlinearity Compensation for Step Imprint Lithography Tool

โœ Scribed by Lu, Bing-heng ;Liu, Hong-zhong ;Ding, Yu-cheng ;Wang, Li ;Qiu, Zhi-hui


Book ID
107378104
Publisher
Higher Education Press and Springer
Year
2006
Tongue
English
Weight
209 KB
Volume
1
Category
Article
ISSN
1673-3479

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โœ J. Kettle; P. Coppo; G. Lalev; C. Tattershall; S. Dimov; M.L. Turner ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 515 KB

A formulation including dissolved phosphorescent iridium complex has been synthesised as a resist for step and flash imprint lithography (S-FIL TM ). Functional properties of the resist after curing are demonstrated and structures as small as 50 nm have been successfully imprinted with this material