✦ LIBER ✦

Selective dry etch process for step and flash imprint lithography

✍ Scribed by Ngoc V. Le; William J. Dauksher; Kathy A. Gehoski; Douglas J. Resnick; A.E. Hooper; Steve Johnson; Grant Willson

Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 612 KB
Volume: 78-79
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2005.01.013

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Development and validation of functional

Development and validation of functional imprint material for the step and flash imprint lithography process

✍ J. Kettle; P. Coppo; G. Lalev; C. Tattershall; S. Dimov; M.L. Turner 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 515 KB

A formulation including dissolved phosphorescent iridium complex has been synthesised as a resist for step and flash imprint lithography (S-FIL TM ). Functional properties of the resist after curing are demonstrated and structures as small as 50 nm have been successfully imprinted with this material

Kinetic parameters for step and flash im

Kinetic parameters for step and flash imprint lithography photopolymerization

✍ Michael D. Dickey; C. Grant Willson 📂 Article 📅 2006 🏛 American Institute of Chemical Engineers 🌐 English ⚖ 203 KB 👁 1 views

Squeeze time investigations for step and

Squeeze time investigations for step and flash imprint lithography

✍ Sander F. Wuister; Jeroen H. Lammers; Yvonne W. Kruijt-Stegeman; Leendert van de 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 301 KB

Simulation of fluid flow in the step and

Simulation of fluid flow in the step and flash imprint lithography process

✍ Shravanthi Reddy; Roger T. Bonnecaze 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 360 KB