A formulation including dissolved phosphorescent iridium complex has been synthesised as a resist for step and flash imprint lithography (S-FIL TM ). Functional properties of the resist after curing are demonstrated and structures as small as 50 nm have been successfully imprinted with this material
Simulation of fluid flow in the step and flash imprint lithography process
β Scribed by Shravanthi Reddy; Roger T. Bonnecaze
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 360 KB
- Volume
- 82
- Category
- Article
- ISSN
- 0167-9317
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