Development and validation of functional imprint material for the step and flash imprint lithography process

✍ Scribed by J. Kettle; P. Coppo; G. Lalev; C. Tattershall; S. Dimov; M.L. Turner

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 515 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.12.070

✦ Synopsis

A formulation including dissolved phosphorescent iridium complex has been synthesised as a resist for step and flash imprint lithography (S-FIL TM ). Functional properties of the resist after curing are demonstrated and structures as small as 50 nm have been successfully imprinted with this material onto a 4 in. silicon wafer. Fluorescent microscopy images demonstrate increased fluorescent signals where arrays of nano structures are imprinted. This technique of direct imprinting of functional materials could potentially lead to rapid, high throughput and low-cost fabrication of nanoscale organic devices and circuits.