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Design of orientation stages for step and flash imprint lithography

โœ Scribed by B.J. Choi; S.V. Sreenivasan; S. Johnson; M. Colburn; C.G. Wilson


Book ID
108400569
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
700 KB
Volume
25
Category
Article
ISSN
0141-6359

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Development and validation of functional
โœ J. Kettle; P. Coppo; G. Lalev; C. Tattershall; S. Dimov; M.L. Turner ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 515 KB

A formulation including dissolved phosphorescent iridium complex has been synthesised as a resist for step and flash imprint lithography (S-FIL TM ). Functional properties of the resist after curing are demonstrated and structures as small as 50 nm have been successfully imprinted with this material