Multibeam electron source for nanofabrication using electron beam induced deposition

✍ Scribed by M.J. van Bruggen; B. van Someren; P. Kruit

• Book ID: 104050587
• Publisher: Elsevier Science
• Year: 2006
• Tongue: English
• Weight: 375 KB
• Volume: 83
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2006.01.252

✦ Synopsis

A multibeam electron beam induced deposition (EBID) system is presented, which can be used for the fabrication of sub-10 nm structures with EBID. This system consists of a scanning electron microscope (SEM) column and a modified source section with a microfabricated lens array. This lens array produces 100 virtual sources that are imaged demagnified onto a wafer to obtain an array of 1 nm probes, which is one order of magnitude lower than reported previously on single-column multibeam systems. In this paper, results are presented of tests on the first prototype, showing the functioning of the microlens array.