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Electron-beam induced deposition nears limit: Nanofabrication

✍ Scribed by Mark Telford

Book ID: 104417570
Publisher: Elsevier Science
Year: 2005
Tongue: English
Weight: 277 KB
Volume: 8
Category: Article
ISSN: 1369-7021
DOI: 10.1016/s1369-7021(05)71016-6

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