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Electron beam induced deposited etch masks

โœ Scribed by C.Th.H. Heerkens; M.J. Kamerbeek; W.F. van Dorp; C.W. Hagen; J. Hoekstra


Book ID
104052146
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
519 KB
Volume
86
Category
Article
ISSN
0167-9317

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We report on the use of a carbon-rich Pt-based material, obtained by electron and ion beam assisted deposition from metal-organic precursor, as a mask for pattern transfer processes. Thin and narrow mask patterns subjected to oxygen plasma and reactive ion etching (RIE) of silicon in SF 6 were inves