Investigating Pattern Transfer in the Small-Gap Regime Using Electron-Beam Stabilized Nanoparticle Array Etch Masks

✍ Scribed by Hogg, C.R.; Majetich, S.A.; Bain, J.A.

• Book ID: 114653750
• Publisher: IEEE
• Year: 2010
• Tongue: English
• Weight: 850 KB
• Volume: 46
• Category: Article
• ISSN: 0018-9464
• DOI: 10.1109/tmag.2010.2040145