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Formation of masking pattern by electron beam-induced vapor deposition

✍ Scribed by M. A. Bruk; E. N. Zhikharev; S. L. Shevchuk; I. A. Volegova; A. V. Spirin; E. N. Teleshov; V. A. Kal’nov; Yu. P. Maishev

Book ID
110164643
Publisher
SP MAIK Nauka/Interperiodica
Year
2008
Tongue
English
Weight
477 KB
Volume
42
Category
Article
ISSN
0018-1439

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We report on the use of a carbon-rich Pt-based material, obtained by electron and ion beam assisted deposition from metal-organic precursor, as a mask for pattern transfer processes. Thin and narrow mask patterns subjected to oxygen plasma and reactive ion etching (RIE) of silicon in SF 6 were inves