Features of resist-free formation of masking pattern by electron beam-induced vapor deposition

✍ Scribed by M. A. Bruk; E. N. Zhikharev; S. L. Shevchuk; I. A. Volegova; A. V. Spirin; E. N. Teleshov; V. A. Kal’nov; Yu. P. Maishev

• Book ID: 110164687
• Publisher: SP MAIK Nauka/Interperiodica
• Year: 2008
• Tongue: English
• Weight: 297 KB
• Volume: 42
• Category: Article
• ISSN: 0018-1439
• DOI: 10.1134/s0018143908050056