The new dry method of mask (relief) formation by direct electron-beam etching of resist

✍ Scribed by Bruk, M.A.; Zhikharev, E.N.; Streltsov, D.R.; Kalnov, V.A.; Spirin, A.V.

• Book ID: 122395420
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 547 KB
• Volume: 112
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2013.06.003