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A new method of formation of the masking image (relief) directly during the electron-beam exposure of the resist

✍ Scribed by Bruk, M. A.; Zhikharev, E. N.; Kal’nov, V. A.; Spirin, A. V.; Strel’tsov, D. R.

Book ID
121626802
Publisher
Springer
Year
2013
Tongue
English
Weight
663 KB
Volume
42
Category
Article
ISSN
1063-7397

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