The direct resist-free deposition of a lithographic mask from vapor initiated by an electron beam

✍ Scribed by M. A. Bruk; E. N. Zhikharev; S. L. Shevchuk; I. A. Volegova; A. V. Spirin; E. N. Teleshov; V. A. Kal’nov; Yu. P. Maishev

• Book ID: 110184258
• Publisher: International Academic Publishing Co (Nauka/Interperiodica)
• Year: 2008
• Tongue: English
• Weight: 452 KB
• Volume: 82
• Category: Article
• ISSN: 0036-0244
• DOI: 10.1134/s0036024408100178