๐”– Bobbio Scriptorium
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Application of a new analytical technique of electron distribution calculations to the profile simulation of a high sensitivity negative electron-beam resist

โœ Scribed by Glezos, N.


Book ID
125427399
Publisher
AVS (American Vacuum Society)
Year
1992
Tongue
English
Weight
589 KB
Volume
10
Category
Article
ISSN
0734-211X

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