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MOSFET carrier mobility model based on gate oxide thickness, threshold and gate voltages

โœ Scribed by Kai Chen; H. Clement Wann; Jon Dunster; Ping K. Ko; Chenming Hu; Makoto Yoshida


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
243 KB
Volume
39
Category
Article
ISSN
0038-1101

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