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New observation and improvement in GIDL of n-MOSFETs with various kinds of N2O-based gate oxides under hot-carrier stress

✍ Scribed by P.T. Lai; Xu Jingping; X. Zeng; Y.C. Cheng


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
394 KB
Volume
39
Category
Article
ISSN
0038-1101

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