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Modulation of atomic-layer-deposited Al2O3 film passivation of silicon surface by rapid thermal processing

✍ Scribed by D. Lei; X. Yu; L. Song; X. Gu; G. Li; D. Yang

Book ID: 126641344
Publisher: American Institute of Physics
Year: 2011
Tongue: English
Weight: 777 KB
Volume: 99
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.3616145

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