𝔖 Bobbio Scriptorium
✦   LIBER   ✦

MOCVD and ALD of High-k Dielectric Oxides Using Alkoxide Precursors

✍ Scribed by A. C. Jones; H. C. Aspinall; P. R. Chalker; R. J. Potter; T. D. Manning; Y. F. Loo; R. O'Kane; J. M. Gaskell; L. M. Smith


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
977 KB
Volume
12
Category
Article
ISSN
0948-1907

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Liquid injection MOCVD and ALD of ZrO2 u
✍ Jeffrey M. Gaskell; Anthony C. Jones; Kate Black; Paul R. Chalker; Thomas Leese; 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 268 KB

Thin films of ZrO 2 have been deposited by liquid injection MOCVD and ALD using the cyclopentadienyl-based Zr precursors [(MeCp) 2 ZrMe (OMe)] and [(MeCp) 2 ZrMe(OBu t )]. Analysis by X-ray diffraction showed that films grown at low temperature (300 °C) by ALD were amorphous, whist films deposited a