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MOCVD and ALD of CeO2 Thin Films using a Novel Monomeric CeIV Alkoxide Precursor

✍ Scribed by Jacqueline S. Wrench; Kate Black; Helen C. Aspinall; Anthony C. Jones; John Bacsa; Paul R. Chalker; Peter J. King; Matthew Werner; Hywel O. Davies; Peter N. Heys

Publisher: John Wiley and Sons
Year: 2009
Tongue: English
Weight: 173 KB
Volume: 15
Category: Article
ISSN: 0948-1907
DOI: 10.1002/cvde.200904279

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