Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films

✍ Scribed by P. A. Williams; J. L. Roberts; A. C. Jones; P. R. Chalker; N. L. Tobin; J. F. Bickley; H. O. Davies; L. M. Smith; T. J. Leedham

• Publisher: John Wiley and Sons
• Year: 2002
• Tongue: English
• Weight: 404 KB
• Volume: 8
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/1521-3862(20020704)8:4<163::aid-cvde163>3.0.co;2-v