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Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films.

✍ Scribed by Paul A. Williams; John L. Roberts; Anthony C. Jones; Paul R. Chalker; Neil L. Tobin; Jamie F. Bickley; Hywel O. Davies; Lesley M. Smith; Timothy J. Leedham

Publisher: John Wiley and Sons
Year: 2010
Weight: 34 KB
Volume: 33
Category: Article
ISSN: 0931-7597
DOI: 10.1002/chin.200243019

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