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Migration of oxygen vacancy in HfO[sub 2] and across the HfO[sub 2]âSiO[sub 2] interface: A first-principles investigation

✍ Scribed by Capron, Nathalie; Broqvist, Peter; Pasquarello, Alfredo

Book ID: 120303134
Publisher: American Institute of Physics
Year: 2007
Tongue: English
Weight: 443 KB
Volume: 91
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.2807282

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Migration of oxygen vacancy in HfO[sub 2] and across the HfO[sub 2]âSiO[sub 2] interface: A first-principles investigation

Migration of oxygen vacancy in HfO[sub 2] and across the HfO[sub 2]âSiO[sub 2] interface: A first-principles investigation