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Microstructure and electrical characteristics of Cr–Si–Ni films deposited on glass and Si (1 0 0) substrates by RF magnetron sputtering

✍ Scribed by Yuqin Zhang; Xianping Dong; Jiansheng Wu

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 298 KB
Volume: 113
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2004.07.086

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Microstructure and electrical characteristics of Cr–Si–Ni films deposited on glass and Si (1&#xa0;0&#xa0;0) substrates by RF magnetron sputtering

Microstructure and electrical characteristics of Cr–Si–Ni films deposited on glass and Si (1 0 0) substrates by RF magnetron sputtering