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Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition

โœ Scribed by T. P. Smirnova; A. M. Badalyan; V. O. Borisov; L. V. Yakovkina; V. V. Kaichev; A. N. Shmakov; A. V. Nartova; V.I. Rakhlin; A. N. Fomina


Book ID
111546555
Publisher
SP MAIK Nauka/Interperiodica
Year
2003
Tongue
English
Weight
331 KB
Volume
44
Category
Article
ISSN
0022-4766

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Thin silicon nitride films were prepared at 350 ยฐC by inductively coupled plasma chemical vapor deposition on Si(100) substrates under different NH 3 /SiH 4 or N 2 /SiH 4 gas mixture. The chemical composition and bonding structure of the deposited films were investigated as a function of the process