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Plasma-Enhanced Chemical Vapor Deposition of Silicon Carbonitride Films from Volatile Silyl Derivatives of 1,1-Dimethylhydrazine

✍ Scribed by T. P. Smirnova; A. M. Badalyan; V. O. Borisov; L. V. Yakovkina; V. V. Kaichev; A. N. Shmakov; A. V. Nartova; V. I. Rakhlin; A. N. Fomina

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