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Measurement of drift mobility in AlGaN/GaN heterostructure field-effect transistor

โœ Scribed by Dang, X. Z.; Asbeck, P. M.; Yu, E. T.; Sullivan, G. J.; Chen, M. Y.; McDermott, B. T.; Boutros, K. S.; Redwing, J. M.


Book ID
125840118
Publisher
American Institute of Physics
Year
1999
Tongue
English
Weight
251 KB
Volume
74
Category
Article
ISSN
0003-6951

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AlGaN/GaInN/GaN heterostructure field-ef
โœ Ikki, Hiromichi ;Isobe, Yasuhiro ;Iida, Daisuke ;Iwaya, Motoaki ;Takeuchi, Tetsu ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 428 KB

## Abstract We report on the electrical properties of AlGaN/GaInN heterostructures fabricated with various InN molar fractions from 0 to 0.60 in GaInN on a GaN template. The sheet carrier density of the AlGaN/GaInN heterostructure monotonically increased with increasing InN molar fraction in GaInN,