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Magnetically Enhanced Inductively Coupled Plasma Etching of 6H-SiC

✍ Scribed by Kim, D.W.; Lee, H.Y.; Kyoung, S.J.; Kim, H.S.; Sung, Y.J.; Chae, S.H.; Yeom, G.Y.


Book ID
127080247
Publisher
IEEE
Year
2004
Tongue
English
Weight
317 KB
Volume
32
Category
Article
ISSN
0093-3813

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Magnetically enhanced inductively couple
✍ M Murata; Y Takeuchi; S Nishida πŸ“‚ Article πŸ“… 1997 πŸ› Elsevier Science 🌐 English βš– 539 KB

Radio-frequency (73.56 MHz) excited SiH, plasma is produced with an electrode of a ladder-shaped antenna with rotating magnetic fields. The negative self-bias potential on the electrode, the SiH emission intensity and the deposition rate of a-Si:H films prepared on glass substrates are examined as a