High rate etching of 6H–SiC in SF6-based magnetically-enhanced inductively coupled plasmas

✍ Scribed by D.W. Kim; H.Y. Lee; B.J. Park; H.S. Kim; Y.J. Sung; S.H. Chae; Y.W. Ko; G.Y. Yeom

• Book ID: 113936440
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 632 KB
• Volume: 447-448
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2003.09.030