✦ LIBER ✦

Etching of 4H-SiC using a NF3inductively coupled plasma

✍ Scribed by Byungwhan Kim; Byung-Teak Lee

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Inductively coupled plasma reactive ion

✍ Hyun-Joon Choi; Byung-Teak Lee 📂 Article 📅 2003 🏛 Springer US 🌐 English ⚖ 328 KB

Etching profile of silicon carbide in a

✍ Byungwhan Kim; Suk Yong Lee; Byung-Teak Lee 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 283 KB

The electrical characteristics of 4H-SiC

✍ N. O. V. Plank; Liudi Jiang; A. M. Gundlach; R. Cheung 📂 Article 📅 2003 🏛 Springer US 🌐 English ⚖ 195 KB

Inductively coupled plasma etching of Hg

✍ E. Laffosse; J. Baylet; J. P. Chamonal; G. Destefanis; G. Cartry; C. Cardinaud 📂 Article 📅 2005 🏛 Springer US 🌐 English ⚖ 108 KB

Dry etching of LaNiO3 thin films using i

✍ Gwan-Ha Kim; Dong-Pyo Kim; Kyoung-Tae Kim; Chang-Il Kim; Cheol-In Lee; Tae-Hyung 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 226 KB

Inductively coupled plasma etch damage i

✍ E. Danielsson; S. -K. Lee; C. -M. Zetterling; M. Östling 📂 Article 📅 2001 🏛 Springer US 🌐 English ⚖ 181 KB