Inductively coupled plasma etch damage in 4H−SiC investigated by Schottky diode characterization

✍ Scribed by E. Danielsson; S. -K. Lee; C. -M. Zetterling; M. Östling

• Book ID: 107452601
• Publisher: Springer US
• Year: 2001
• Tongue: English
• Weight: 181 KB
• Volume: 30
• Category: Article
• ISSN: 0361-5235
• DOI: 10.1007/s11664-001-0024-0