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Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

✍ Scribed by E. Laffosse; J. Baylet; J. P. Chamonal; G. Destefanis; G. Cartry; C. Cardinaud

Book ID: 107453321
Publisher: Springer US
Year: 2005
Tongue: English
Weight: 108 KB
Volume: 34
Category: Article
ISSN: 0361-5235
DOI: 10.1007/s11664-005-0013-9

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