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Low temperature epitaxial silicon film growth using high vacuum electron-cyclotron-resonance plasma deposition

โœ Scribed by S. J. Deboer; V. L. Dalal; G. Chumanov; R. Bartels


Book ID
126072323
Publisher
American Institute of Physics
Year
1995
Tongue
English
Weight
290 KB
Volume
66
Category
Article
ISSN
0003-6951

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