Growth of high quality amorphous silicon-germanium films using low pressure remote electron-cyclotron-resonance discharge

✍ Scribed by Sanjeev Kaushal; Vikram Dalal; Jun Xu

• Book ID: 115990947
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 317 KB
• Volume: 198-200
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/0022-3093(95)00764-4