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Low-temperature deposition of SiO2 films using plasma-enhanced oxygen with reduction of oxygen-originated damage

✍ Scribed by Jun-ichi Nishizawa; Toru Kurabayashi; Kyozo Kanamoto; Takashi Yoshida; Toru Oizumi

Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 232 KB
Volume: 6
Category: Article
ISSN: 1369-8001
DOI: 10.1016/j.mssp.2003.08.020

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