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Low temperature deposition of SiC thin films on polymer surface by plasma CVD

✍ Scribed by H Anma; Y Yoshimoto; M Warashina; Y Hatanaka

Book ID
108417413
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
202 KB
Volume
175-176
Category
Article
ISSN
0169-4332

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## Abstract BN films deposited from a BF~3~ο£ΏNH~3~ precursor, under chemical vapour infiltration conditions, on plane sintered α‐SiC substrates were analysed by XPS. The films are non‐stoichiometric with an N/B atomic ratio of <1. They also contain significant amounts of oxygen atoms, homogeneously